Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering
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Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering
In this work, the influence of the substrate bias on the crystalline structure and surface composition of Ti6Al4V thin films prepared by rf magnetron sputtering were studied. Samples were grown onto two different types of substrates: AISI 420 steel and common glass using a Ti6Al4V (99.9 %) target. Substrate bias was varied from –100V to –200 V. Samples were characterized by X-ray diffraction (X...
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In this study, NiTi thin films were deposited on the glass and NaCl substrates by means of magnetron sputtering method. The influence of aging temperature, over the range 300-500 oC, on phase transformation and mechanical properties of the sputtered NiTi thin films were studied by differential scanning calorimetry (DSC) and nano-indentation assay, respectively. The DSC curves showed that the ag...
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ژورنال
عنوان ژورنال: Journal of Biomedical Materials Research
سال: 1995
ISSN: 0021-9304
DOI: 10.1002/jbm.820290218